Characterization of thick graded Si1-xGex/Si layers grown by low energy plasma enhanced chemical vapour deposition

10.1016/S0168-583X(03)01820-2

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Main Authors: Seng, H.L., Breese, M.B.H., Watt, F., Kummer, M., Von Känel, H.
Other Authors: PHYSICS
Format: Article
Published: 2014
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Online Access:http://scholarbank.nus.edu.sg/handle/10635/95969
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-959692023-10-27T07:30:52Z Characterization of thick graded Si1-xGex/Si layers grown by low energy plasma enhanced chemical vapour deposition Seng, H.L. Breese, M.B.H. Watt, F. Kummer, M. Von Känel, H. PHYSICS Beam bending Graded silicon-germanium Ion channeling LEPECVD 10.1016/S0168-583X(03)01820-2 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 215 1-2 235-239 NIMBE 2014-10-16T09:17:57Z 2014-10-16T09:17:57Z 2004-01 Article Seng, H.L., Breese, M.B.H., Watt, F., Kummer, M., Von Känel, H. (2004-01). Characterization of thick graded Si1-xGex/Si layers grown by low energy plasma enhanced chemical vapour deposition. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 215 (1-2) : 235-239. ScholarBank@NUS Repository. https://doi.org/10.1016/S0168-583X(03)01820-2 0168583X http://scholarbank.nus.edu.sg/handle/10635/95969 000188400400030 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Beam bending
Graded silicon-germanium
Ion channeling
LEPECVD
spellingShingle Beam bending
Graded silicon-germanium
Ion channeling
LEPECVD
Seng, H.L.
Breese, M.B.H.
Watt, F.
Kummer, M.
Von Känel, H.
Characterization of thick graded Si1-xGex/Si layers grown by low energy plasma enhanced chemical vapour deposition
description 10.1016/S0168-583X(03)01820-2
author2 PHYSICS
author_facet PHYSICS
Seng, H.L.
Breese, M.B.H.
Watt, F.
Kummer, M.
Von Känel, H.
format Article
author Seng, H.L.
Breese, M.B.H.
Watt, F.
Kummer, M.
Von Känel, H.
author_sort Seng, H.L.
title Characterization of thick graded Si1-xGex/Si layers grown by low energy plasma enhanced chemical vapour deposition
title_short Characterization of thick graded Si1-xGex/Si layers grown by low energy plasma enhanced chemical vapour deposition
title_full Characterization of thick graded Si1-xGex/Si layers grown by low energy plasma enhanced chemical vapour deposition
title_fullStr Characterization of thick graded Si1-xGex/Si layers grown by low energy plasma enhanced chemical vapour deposition
title_full_unstemmed Characterization of thick graded Si1-xGex/Si layers grown by low energy plasma enhanced chemical vapour deposition
title_sort characterization of thick graded si1-xgex/si layers grown by low energy plasma enhanced chemical vapour deposition
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/95969
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