Characterization of thick graded Si1-xGex/Si layers grown by low energy plasma enhanced chemical vapour deposition

• Main Authors: Seng, H.L., Breese, M.B.H., Watt, F., Kummer, M., Von Känel, H.
• Other Authors: PHYSICS
• Format: Article
• Published: 2014
• Subjects: Beam bending; Graded silicon-germanium; Ion channeling; LEPECVD
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/95969
• Institution: National University of Singapore

10.1016/S0168-583X(03)01820-2