Chemical tuning of band alignments for metal gate/high- κ oxide interfaces
10.1103/PhysRevB.73.045302
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Main Authors: | , , , |
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Other Authors: | |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/95984 |
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Institution: | National University of Singapore |
Summary: | 10.1103/PhysRevB.73.045302 |
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