Chemical tuning of band alignments for metal gate/high- κ oxide interfaces

Chemical tuning of band alignments for metal gate/high- κ oxide interfaces

10.1103/PhysRevB.73.045302

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Bibliographic Details
Main Authors:	Dong, Y.F., Wang, S.J., Feng, Y.P., Huan, A.C.H.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/95984
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Institution:	National University of Singapore

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