Chemical tuning of band alignments for metal gate/high- κ oxide interfaces
10.1103/PhysRevB.73.045302
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sg-nus-scholar.10635-959842024-11-09T10:15:20Z Chemical tuning of band alignments for metal gate/high- κ oxide interfaces Dong, Y.F. Wang, S.J. Feng, Y.P. Huan, A.C.H. PHYSICS 10.1103/PhysRevB.73.045302 Physical Review B - Condensed Matter and Materials Physics 73 4 - PRBMD 2014-10-16T09:18:07Z 2014-10-16T09:18:07Z 2006 Article Dong, Y.F., Wang, S.J., Feng, Y.P., Huan, A.C.H. (2006). Chemical tuning of band alignments for metal gate/high- κ oxide interfaces. Physical Review B - Condensed Matter and Materials Physics 73 (4) : -. ScholarBank@NUS Repository. https://doi.org/10.1103/PhysRevB.73.045302 10980121 http://scholarbank.nus.edu.sg/handle/10635/95984 000235009700063 Scopus |
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10.1103/PhysRevB.73.045302 |
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PHYSICS Dong, Y.F. Wang, S.J. Feng, Y.P. Huan, A.C.H. |
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Dong, Y.F. Wang, S.J. Feng, Y.P. Huan, A.C.H. |
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Dong, Y.F. Wang, S.J. Feng, Y.P. Huan, A.C.H. Chemical tuning of band alignments for metal gate/high- κ oxide interfaces |
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Dong, Y.F. |
title |
Chemical tuning of band alignments for metal gate/high- κ oxide interfaces |
title_short |
Chemical tuning of band alignments for metal gate/high- κ oxide interfaces |
title_full |
Chemical tuning of band alignments for metal gate/high- κ oxide interfaces |
title_fullStr |
Chemical tuning of band alignments for metal gate/high- κ oxide interfaces |
title_full_unstemmed |
Chemical tuning of band alignments for metal gate/high- κ oxide interfaces |
title_sort |
chemical tuning of band alignments for metal gate/high- κ oxide interfaces |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/95984 |
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