Effect of nitrogen incorporation on the electronic structure and thermal stability of HfO2 gate dielectric

10.1063/1.2202752

Saved in:

Bibliographic Details
Main Authors:	Wang, S.J., Chai, J.W., Dong, Y.F., Feng, Y.P., Sutanto, N., Pan, J.S., Huan, A.C.H.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/96329
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore

id	sg-nus-scholar.10635-96329
record_format	dspace
spelling	sg-nus-scholar.10635-963292024-11-09T10:16:01Z Effect of nitrogen incorporation on the electronic structure and thermal stability of HfO2 gate dielectric Wang, S.J. Chai, J.W. Dong, Y.F. Feng, Y.P. Sutanto, N. Pan, J.S. Huan, A.C.H. PHYSICS 10.1063/1.2202752 Applied Physics Letters 88 19 - APPLA 2014-10-16T09:22:09Z 2014-10-16T09:22:09Z 2006 Article Wang, S.J., Chai, J.W., Dong, Y.F., Feng, Y.P., Sutanto, N., Pan, J.S., Huan, A.C.H. (2006). Effect of nitrogen incorporation on the electronic structure and thermal stability of HfO2 gate dielectric. Applied Physics Letters 88 (19) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2202752 00036951 http://scholarbank.nus.edu.sg/handle/10635/96329 000237477400041 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1063/1.2202752
author2	PHYSICS
author_facet	PHYSICS Wang, S.J. Chai, J.W. Dong, Y.F. Feng, Y.P. Sutanto, N. Pan, J.S. Huan, A.C.H.
format	Article
author	Wang, S.J. Chai, J.W. Dong, Y.F. Feng, Y.P. Sutanto, N. Pan, J.S. Huan, A.C.H.
spellingShingle	Wang, S.J. Chai, J.W. Dong, Y.F. Feng, Y.P. Sutanto, N. Pan, J.S. Huan, A.C.H. Effect of nitrogen incorporation on the electronic structure and thermal stability of HfO2 gate dielectric
author_sort	Wang, S.J.
title	Effect of nitrogen incorporation on the electronic structure and thermal stability of HfO2 gate dielectric
title_short	Effect of nitrogen incorporation on the electronic structure and thermal stability of HfO2 gate dielectric
title_full	Effect of nitrogen incorporation on the electronic structure and thermal stability of HfO2 gate dielectric
title_fullStr	Effect of nitrogen incorporation on the electronic structure and thermal stability of HfO2 gate dielectric
title_full_unstemmed	Effect of nitrogen incorporation on the electronic structure and thermal stability of HfO2 gate dielectric
title_sort	effect of nitrogen incorporation on the electronic structure and thermal stability of hfo2 gate dielectric
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/96329
_version_	1821214043851980800

Effect of nitrogen incorporation on the electronic structure and thermal stability of HfO2 gate dielectric

Similar Items