Effects of prolonged annealing on NiSi at low temperature (500°C)

Journal of Electronic Materials

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Main Authors:	Anisur, M.R., Osipowicz, T., Chi, D.Z., Wang, W.D.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Subjects:	Agglomeration Interface roughness Nickel monosilicide (NiSi) Prolonged annealing Thermal stability
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/96376
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-96376
record_format	dspace
spelling	sg-nus-scholar.10635-963762024-11-08T20:20:05Z Effects of prolonged annealing on NiSi at low temperature (500°C) Anisur, M.R. Osipowicz, T. Chi, D.Z. Wang, W.D. PHYSICS Agglomeration Interface roughness Nickel monosilicide (NiSi) Prolonged annealing Thermal stability Journal of Electronic Materials 34 8 1110-1114 JECMA 2014-10-16T09:22:43Z 2014-10-16T09:22:43Z 2005-08 Article Anisur, M.R.,Osipowicz, T.,Chi, D.Z.,Wang, W.D. (2005-08). Effects of prolonged annealing on NiSi at low temperature (500°C). Journal of Electronic Materials 34 (8) : 1110-1114. ScholarBank@NUS Repository. 03615235 http://scholarbank.nus.edu.sg/handle/10635/96376 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Agglomeration Interface roughness Nickel monosilicide (NiSi) Prolonged annealing Thermal stability
spellingShingle	Agglomeration Interface roughness Nickel monosilicide (NiSi) Prolonged annealing Thermal stability Anisur, M.R. Osipowicz, T. Chi, D.Z. Wang, W.D. Effects of prolonged annealing on NiSi at low temperature (500°C)
description	Journal of Electronic Materials
author2	PHYSICS
author_facet	PHYSICS Anisur, M.R. Osipowicz, T. Chi, D.Z. Wang, W.D.
format	Article
author	Anisur, M.R. Osipowicz, T. Chi, D.Z. Wang, W.D.
author_sort	Anisur, M.R.
title	Effects of prolonged annealing on NiSi at low temperature (500°C)
title_short	Effects of prolonged annealing on NiSi at low temperature (500°C)
title_full	Effects of prolonged annealing on NiSi at low temperature (500°C)
title_fullStr	Effects of prolonged annealing on NiSi at low temperature (500°C)
title_full_unstemmed	Effects of prolonged annealing on NiSi at low temperature (500°C)
title_sort	effects of prolonged annealing on nisi at low temperature (500°c)
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/96376
_version_	1821197693091840000

Effects of prolonged annealing on NiSi at low temperature (500°C)

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