Effects of prolonged annealing on NiSi at low temperature (500°C)
Journal of Electronic Materials
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Main Authors: | Anisur, M.R., Osipowicz, T., Chi, D.Z., Wang, W.D. |
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Other Authors: | PHYSICS |
Format: | Article |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/96376 |
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Institution: | National University of Singapore |
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