Interface strain study of thin Lu2O3/Si using HRBS

Interface strain study of thin Lu2O3/Si using HRBS

10.1016/j.nimb.2007.12.090

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Bibliographic Details
Main Authors: Chan, T.K., Darmawan, P., Ho, C.S., Malar, P., Lee, P.S., Osipowicz, T.
Other Authors: PHYSICS
Format: Article
Published: 2014
Subjects:
61.85.+p
68.49.-h
68.55.aj
Channeling
High-resolution RBS
Interfacial strain
Lu2O3 thin films
Online Access:http://scholarbank.nus.edu.sg/handle/10635/96960
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/96960

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