Interface strain study of thin Lu2O3/Si using HRBS

10.1016/j.nimb.2007.12.090

Saved in:
Bibliographic Details
Main Authors: Chan, T.K., Darmawan, P., Ho, C.S., Malar, P., Lee, P.S., Osipowicz, T.
Other Authors: PHYSICS
Format: Article
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/96960
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
id sg-nus-scholar.10635-96960
record_format dspace
spelling sg-nus-scholar.10635-969602023-10-30T22:48:46Z Interface strain study of thin Lu2O3/Si using HRBS Chan, T.K. Darmawan, P. Ho, C.S. Malar, P. Lee, P.S. Osipowicz, T. PHYSICS 61.85.+p 68.49.-h 68.55.aj Channeling High-resolution RBS Interfacial strain Lu2O3 thin films 10.1016/j.nimb.2007.12.090 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 266 8 1486-1489 NIMBE 2014-10-16T09:29:38Z 2014-10-16T09:29:38Z 2008-04 Article Chan, T.K., Darmawan, P., Ho, C.S., Malar, P., Lee, P.S., Osipowicz, T. (2008-04). Interface strain study of thin Lu2O3/Si using HRBS. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 266 (8) : 1486-1489. ScholarBank@NUS Repository. https://doi.org/10.1016/j.nimb.2007.12.090 0168583X http://scholarbank.nus.edu.sg/handle/10635/96960 000256677600071 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic 61.85.+p
68.49.-h
68.55.aj
Channeling
High-resolution RBS
Interfacial strain
Lu2O3 thin films
spellingShingle 61.85.+p
68.49.-h
68.55.aj
Channeling
High-resolution RBS
Interfacial strain
Lu2O3 thin films
Chan, T.K.
Darmawan, P.
Ho, C.S.
Malar, P.
Lee, P.S.
Osipowicz, T.
Interface strain study of thin Lu2O3/Si using HRBS
description 10.1016/j.nimb.2007.12.090
author2 PHYSICS
author_facet PHYSICS
Chan, T.K.
Darmawan, P.
Ho, C.S.
Malar, P.
Lee, P.S.
Osipowicz, T.
format Article
author Chan, T.K.
Darmawan, P.
Ho, C.S.
Malar, P.
Lee, P.S.
Osipowicz, T.
author_sort Chan, T.K.
title Interface strain study of thin Lu2O3/Si using HRBS
title_short Interface strain study of thin Lu2O3/Si using HRBS
title_full Interface strain study of thin Lu2O3/Si using HRBS
title_fullStr Interface strain study of thin Lu2O3/Si using HRBS
title_full_unstemmed Interface strain study of thin Lu2O3/Si using HRBS
title_sort interface strain study of thin lu2o3/si using hrbs
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/96960
_version_ 1781786575998287872