Characterization of HfO2/Si(0 0 1) interface with high-resolution rutherford backscattering spectroscopy

Characterization of HfO2/Si(0 0 1) interface with high-resolution rutherford backscattering spectroscopy

10.1016/j.apsusc.2004.06.087

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Bibliographic Details
Main Authors: Nakajima, K., Joumori, S., Suzuki, M., Kimura, K., Osipowicz, T., Tok, K.L., Zheng, J.Z., See, A., Zhang, B.C.
Other Authors: PHYSICS
Format: Conference or Workshop Item
Published: 2014
Subjects:
HfO2/Si(0 01)
High-resolution
Strain profile
Online Access:http://scholarbank.nus.edu.sg/handle/10635/98651
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Institution: National University of Singapore
id sg-nus-scholar.10635-98651
record_format dspace
spelling sg-nus-scholar.10635-986512023-10-25T07:38:18Z Characterization of HfO2/Si(0 0 1) interface with high-resolution rutherford backscattering spectroscopy Nakajima, K. Joumori, S. Suzuki, M. Kimura, K. Osipowicz, T. Tok, K.L. Zheng, J.Z. See, A. Zhang, B.C. PHYSICS HfO2/Si(0 01) High-resolution Strain profile 10.1016/j.apsusc.2004.06.087 Applied Surface Science 237 1-4 416-420 ASUSE 2014-10-16T09:49:47Z 2014-10-16T09:49:47Z 2004-10-15 Conference Paper Nakajima, K., Joumori, S., Suzuki, M., Kimura, K., Osipowicz, T., Tok, K.L., Zheng, J.Z., See, A., Zhang, B.C. (2004-10-15). Characterization of HfO2/Si(0 0 1) interface with high-resolution rutherford backscattering spectroscopy. Applied Surface Science 237 (1-4) : 416-420. ScholarBank@NUS Repository. https://doi.org/10.1016/j.apsusc.2004.06.087 01694332 http://scholarbank.nus.edu.sg/handle/10635/98651 000224739100075 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic HfO2/Si(0 01)
High-resolution
Strain profile
spellingShingle HfO2/Si(0 01)
High-resolution
Strain profile
Nakajima, K.
Joumori, S.
Suzuki, M.
Kimura, K.
Osipowicz, T.
Tok, K.L.
Zheng, J.Z.
See, A.
Zhang, B.C.
Characterization of HfO2/Si(0 0 1) interface with high-resolution rutherford backscattering spectroscopy
description 10.1016/j.apsusc.2004.06.087
author2 PHYSICS
author_facet PHYSICS
Nakajima, K.
Joumori, S.
Suzuki, M.
Kimura, K.
Osipowicz, T.
Tok, K.L.
Zheng, J.Z.
See, A.
Zhang, B.C.
format Conference or Workshop Item
author Nakajima, K.
Joumori, S.
Suzuki, M.
Kimura, K.
Osipowicz, T.
Tok, K.L.
Zheng, J.Z.
See, A.
Zhang, B.C.
author_sort Nakajima, K.
title Characterization of HfO2/Si(0 0 1) interface with high-resolution rutherford backscattering spectroscopy
title_short Characterization of HfO2/Si(0 0 1) interface with high-resolution rutherford backscattering spectroscopy
title_full Characterization of HfO2/Si(0 0 1) interface with high-resolution rutherford backscattering spectroscopy
title_fullStr Characterization of HfO2/Si(0 0 1) interface with high-resolution rutherford backscattering spectroscopy
title_full_unstemmed Characterization of HfO2/Si(0 0 1) interface with high-resolution rutherford backscattering spectroscopy
title_sort characterization of hfo2/si(0 0 1) interface with high-resolution rutherford backscattering spectroscopy
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/98651
_version_ 1781786924251348992

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