In-line plasma induced charging monitor for 0.15μm polysilicon gate etching

In-line plasma induced charging monitor for 0.15μm polysilicon gate etching

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

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Main Authors: Chong, D., Won Jong Yoo, Ting Cheong Ang, Sang Yee Loong, Cha, R., Pin Hian Lee, Layadi, N., Chan, L., See, A.
Other Authors: PHYSICS
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/98760
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Institution: National University of Singapore
id sg-nus-scholar.10635-98760
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spelling sg-nus-scholar.10635-987602015-02-08T13:18:38Z In-line plasma induced charging monitor for 0.15μm polysilicon gate etching Chong, D. Won Jong Yoo Ting Cheong Ang Sang Yee Loong Cha, R. Pin Hian Lee Layadi, N. Chan, L. See, A. PHYSICS International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings 52-55 2014-10-16T09:51:05Z 2014-10-16T09:51:05Z 2001 Conference Paper Chong, D.,Won Jong Yoo,Ting Cheong Ang,Sang Yee Loong,Cha, R.,Pin Hian Lee,Layadi, N.,Chan, L.,See, A. (2001). In-line plasma induced charging monitor for 0.15μm polysilicon gate etching. International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings : 52-55. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/98760 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings
author2 PHYSICS
author_facet PHYSICS
Chong, D.
Won Jong Yoo
Ting Cheong Ang
Sang Yee Loong
Cha, R.
Pin Hian Lee
Layadi, N.
Chan, L.
See, A.
format Conference or Workshop Item
author Chong, D.
Won Jong Yoo
Ting Cheong Ang
Sang Yee Loong
Cha, R.
Pin Hian Lee
Layadi, N.
Chan, L.
See, A.
spellingShingle Chong, D.
Won Jong Yoo
Ting Cheong Ang
Sang Yee Loong
Cha, R.
Pin Hian Lee
Layadi, N.
Chan, L.
See, A.
In-line plasma induced charging monitor for 0.15μm polysilicon gate etching
author_sort Chong, D.
title In-line plasma induced charging monitor for 0.15μm polysilicon gate etching
title_short In-line plasma induced charging monitor for 0.15μm polysilicon gate etching
title_full In-line plasma induced charging monitor for 0.15μm polysilicon gate etching
title_fullStr In-line plasma induced charging monitor for 0.15μm polysilicon gate etching
title_full_unstemmed In-line plasma induced charging monitor for 0.15μm polysilicon gate etching
title_sort in-line plasma induced charging monitor for 0.15μm polysilicon gate etching
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/98760
_version_ 1681092082771427328

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