In-line plasma induced charging monitor for 0.15μm polysilicon gate etching

In-line plasma induced charging monitor for 0.15μm polysilicon gate etching

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

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Bibliographic Details
Main Authors: Chong, D., Won Jong Yoo, Ting Cheong Ang, Sang Yee Loong, Cha, R., Pin Hian Lee, Layadi, N., Chan, L., See, A.
Other Authors: PHYSICS
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/98760
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/98760

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