In-line plasma induced charging monitor for 0.15μm polysilicon gate etching

• Main Authors: Chong, D., Won Jong Yoo, Ting Cheong Ang, Sang Yee Loong, Cha, R., Pin Hian Lee, Layadi, N., Chan, L., See, A.
• Other Authors: PHYSICS
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/98760
• Institution: National University of Singapore

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings