Detection of oxidation stacking faults in silicon wafers by a multipass Fabry-Perot Rayleigh-Brillouin scattering spectrometer

Journal of Crystal Growth

Saved in:
Bibliographic Details
Main Authors: Ng, S.C., Taijing, L.
Other Authors: PHYSICS
Format: Others
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/98970
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore