Patterning of burnishing head using SU-8 hard mask fabricated by deep X-ray lithography

• Main Authors: Maneekat Ch., Phatthanakun R., Siangchaew K., Leksakul K.
• 格式: Conference or Workshop Item
• 語言: English
• 出版: 2014
• 在線閱讀: http://www.scopus.com/inward/record.url?eid=2-s2.0-84866759299&partnerID=40&md5=98013874e499ab3b3666d74b223a25a8; http://cmuir.cmu.ac.th/handle/6653943832/1607
• 機構: Chiang Mai University

This paper studies on the application of X-ray irradiation from synchrotron light for burnishing head patterning. Feasibility study of SU-8 negative photoresist for AlTiC hard mask in reactive ion etching in CF 4 plasma is investigated and compared with chromium and AZ photoresist. X-ray lithography...