Patterning of burnishing head using SU-8 hard mask fabricated by deep X-ray lithography
This paper studies on the application of X-ray irradiation from synchrotron light for burnishing head patterning. Feasibility study of SU-8 negative photoresist for AlTiC hard mask in reactive ion etching in CF 4 plasma is investigated and compared with chromium and AZ photoresist. X-ray lithography...
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| Main Authors: | , , , |
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| Format: | Conference or Workshop Item |
| Language: | English |
| Published: |
2014
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| Online Access: | http://www.scopus.com/inward/record.url?eid=2-s2.0-84866759299&partnerID=40&md5=98013874e499ab3b3666d74b223a25a8 http://cmuir.cmu.ac.th/handle/6653943832/1607 |
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| Institution: | Chiang Mai University |
| Language: | English |