Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography

• Main Authors: Puttaraksa,N., Unai,S., Rhodes,M.W., Singkarat,K., Whitlow,H.J., Singkarat,S.
• Format: Conference or Workshop Item
• Published: Elsevier 2015
• Subjects: Nuclear and High Energy Physics; Instrumentation
• Online Access: http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=84655170025&origin=inward; http://cmuir.cmu.ac.th/handle/6653943832/38611
• Institution: Chiang Mai University

In this study, poly(methyl methacrylate) (PMMA) was investigated as a negative resist by irradiation with a high-fluence 2 MeV proton beam. The beam from a 1.7 MV Tandetron accelerator at the Plasma and Beam Physics Research Facility (PBP) of Chiang Mai University is shaped by a pair of computer-controlled L-shaped apertures which are used to expose rectangular pattern elements with 1-1000 μm side length. Repeated exposure of rectangular pattern elements allows a complex pattern to be built up. After subsequent development, the negative PMMA microstructure was used as a master mold for casting poly(dimethylsiloxane) (PDMS) following a standard soft-lithography process. The PDMS chip fabricated by this technique was demonstrated to be a microfluidic device. © 2011 Elsevier B.V. All rights reserved.