Fabrication of multi-level photoresist patterns in one-step lithography by using Cr/Ni multi-film thickness mask

• المؤلفون الرئيسيون: Narongchai Siwarakrangsun, Nithi Atthi, Supanit Porntheeraphat, Jirawat Jantawong, Komgrit Leksakul, Amporn Poyai
• التنسيق: Book Series
• منشور في: 2018
• الموضوعات: Engineering
• الوصول للمادة أونلاين: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84874043393&origin=inward; http://cmuir.cmu.ac.th/jspui/handle/6653943832/52570

The 3-D microstructure can be formed by using Multi-film thickness mask (MFT-mask) with single exposure and single develop. The intensity of the UV light getting through the mask increases as the thickness of the chromium film decreases. However, the ultra-thin Cr film makes the deposition and etchi...