High rate direct current magnetron sputtered and texture-etched zinc oxide films for silicon thin film solar cells

• المؤلفون الرئيسيون: T. Tohsophon, J. Hüpkes, H. Siekmann, B. Rech, M. Schultheis, N. Sirikulrat
• التنسيق: دورية
• منشور في: 2018
• الموضوعات: Materials Science; Physics and Astronomy
• الوصول للمادة أونلاين: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=42649137956&origin=inward; http://cmuir.cmu.ac.th/jspui/handle/6653943832/60514

Aluminum-doped zinc oxide (AZO) films were prepared by in-line direct current (dc) magnetron sputtering on glass substrates. Four types of ceramic targets with 0.5 wt.% or 1 wt.% of aluminum oxide and different preparation methods, namely normal sintered, soft sintered and hot pressed, were employed...