Effect of Acetylene Concentration on Structural Properties of Hydrogenated Amorphous Carbon Films Prepared using Showerhead Plasma Chemical Vapor Deposition

• المؤلفون الرئيسيون: Artit Chingsungnoen, Thananchai Dasri, Phitsanu Poolcharuansin, Anthika Lakhonchai, Nongkhan Tidngim, Pitak Eiamchai, Noppadon Nuntawong, Vittaya Amornkitbamrung
• التنسيق: บทความวารสาร
• اللغة: English
• منشور في: Science Faculty of Chiang Mai University 2019
• الوصول للمادة أونلاين: http://it.science.cmu.ac.th/ejournal/dl.php?journal_id=9532; http://cmuir.cmu.ac.th/jspui/handle/6653943832/64219

Acetylene/argon plasma was used to deposit hydrogenated amorphous carbon (a-C:H) films using showerhead plasma CVD. The upper electrode was designed like a showerhead to spray gasses onto the grounded electrode and is connected to 10 kHz RF power. The a-C:H films were fabricated with a deposition ti...