Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography

• المؤلفون الرئيسيون: Puttaraksa N., Unai S., Rhodes M.W., Singkarat K., Whitlow H.J., Singkarat S.
• التنسيق: مقال
• اللغة: English
• منشور في: 2014
• الوصول للمادة أونلاين: http://www.scopus.com/inward/record.url?eid=2-s2.0-79951953992&partnerID=40&md5=c51b8a5b814072c61742121fc4fdb141; http://cmuir.cmu.ac.th/handle/6653943832/6854
• المؤسسة: Chiang Mai University

In this study, poly(methyl methacrylate) (PMMA) was investigated as a negative resist by irradiation with a high-fluence 2 MeV proton beam. The beam from a 1.7 MV Tandetron accelerator at the Plasma and Beam Physics Research Facility (PBP) of Chiang Mai University is shaped by a pair of computer-con...