Influence of MeV H + ion beam flux on cross-linking and blister formation in PMMA resist

In soft lithography, a pattern is produced in poly(dimethylsiloxane) (PDMS) elastomer by casting from a master mould. The mould can be made of poly(methylmethacrylate) (PMMA) resist by utilising either its positive or negative tone induced by an ion beam. Here we have investigated the irradiation co...

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Main Authors: Unai S., Puttaraksa N., Pussadee N., Singkarat K., Rhodes M.W., Whitlow H.J., Singkarat S.
Format: Article
Language:English
Published: 2014
Online Access:http://www.scopus.com/inward/record.url?eid=2-s2.0-84857303811&partnerID=40&md5=dde86bc8d9efda1128dad595cecbbaba
http://cmuir.cmu.ac.th/handle/6653943832/7367
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spelling th-cmuir.6653943832-73672014-08-30T04:00:54Z Influence of MeV H + ion beam flux on cross-linking and blister formation in PMMA resist Unai S. Puttaraksa N. Pussadee N. Singkarat K. Rhodes M.W. Whitlow H.J. Singkarat S. In soft lithography, a pattern is produced in poly(dimethylsiloxane) (PDMS) elastomer by casting from a master mould. The mould can be made of poly(methylmethacrylate) (PMMA) resist by utilising either its positive or negative tone induced by an ion beam. Here we have investigated the irradiation conditions for achieving complete cross-linking and absence of blister formation in PMMA so that its negative characteristic can be used in making master moulds. PMMA thin films approximately 9 μm thick on Si were deposited by spin coating. The 2-MeV H + ion beam was generated using a 1.7-MV tandem Tandetron accelerator. The beam was collimated to a 500×500 μm 2 cross section using programmable proximity aperture lithography system with a real-time ion beam monitoring system and a high precision current integrator. The irradiated areas were investigated by a standard scanning electron microscope and a profilometer. It was found that both the ion beam flux and the stopping power of the ions in the polymer have a critical influence on the blister formation. © 2012 by Maejo University, San Sai, Chiang Mai, 50290 Thailand. 2014-08-30T04:00:54Z 2014-08-30T04:00:54Z 2012 Article 19057873 http://www.scopus.com/inward/record.url?eid=2-s2.0-84857303811&partnerID=40&md5=dde86bc8d9efda1128dad595cecbbaba http://cmuir.cmu.ac.th/handle/6653943832/7367 English
institution Chiang Mai University
building Chiang Mai University Library
country Thailand
collection CMU Intellectual Repository
language English
description In soft lithography, a pattern is produced in poly(dimethylsiloxane) (PDMS) elastomer by casting from a master mould. The mould can be made of poly(methylmethacrylate) (PMMA) resist by utilising either its positive or negative tone induced by an ion beam. Here we have investigated the irradiation conditions for achieving complete cross-linking and absence of blister formation in PMMA so that its negative characteristic can be used in making master moulds. PMMA thin films approximately 9 μm thick on Si were deposited by spin coating. The 2-MeV H + ion beam was generated using a 1.7-MV tandem Tandetron accelerator. The beam was collimated to a 500×500 μm 2 cross section using programmable proximity aperture lithography system with a real-time ion beam monitoring system and a high precision current integrator. The irradiated areas were investigated by a standard scanning electron microscope and a profilometer. It was found that both the ion beam flux and the stopping power of the ions in the polymer have a critical influence on the blister formation. © 2012 by Maejo University, San Sai, Chiang Mai, 50290 Thailand.
format Article
author Unai S.
Puttaraksa N.
Pussadee N.
Singkarat K.
Rhodes M.W.
Whitlow H.J.
Singkarat S.
spellingShingle Unai S.
Puttaraksa N.
Pussadee N.
Singkarat K.
Rhodes M.W.
Whitlow H.J.
Singkarat S.
Influence of MeV H + ion beam flux on cross-linking and blister formation in PMMA resist
author_facet Unai S.
Puttaraksa N.
Pussadee N.
Singkarat K.
Rhodes M.W.
Whitlow H.J.
Singkarat S.
author_sort Unai S.
title Influence of MeV H + ion beam flux on cross-linking and blister formation in PMMA resist
title_short Influence of MeV H + ion beam flux on cross-linking and blister formation in PMMA resist
title_full Influence of MeV H + ion beam flux on cross-linking and blister formation in PMMA resist
title_fullStr Influence of MeV H + ion beam flux on cross-linking and blister formation in PMMA resist
title_full_unstemmed Influence of MeV H + ion beam flux on cross-linking and blister formation in PMMA resist
title_sort influence of mev h + ion beam flux on cross-linking and blister formation in pmma resist
publishDate 2014
url http://www.scopus.com/inward/record.url?eid=2-s2.0-84857303811&partnerID=40&md5=dde86bc8d9efda1128dad595cecbbaba
http://cmuir.cmu.ac.th/handle/6653943832/7367
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