Influence of MeV H + ion beam flux on cross-linking and blister formation in PMMA resist

Influence of MeV H + ion beam flux on cross-linking and blister formation in PMMA resist

In soft lithography, a pattern is produced in poly(dimethylsiloxane) (PDMS) elastomer by casting from a master mould. The mould can be made of poly(methylmethacrylate) (PMMA) resist by utilising either its positive or negative tone induced by an ion beam. Here we have investigated the irradiation co...

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Bibliographic Details
Main Authors: Unai S., Puttaraksa N., Pussadee N., Singkarat K., Rhodes M.W., Whitlow H.J., Singkarat S.
Format: Article
Language:English
Published: 2014
Online Access:http://www.scopus.com/inward/record.url?eid=2-s2.0-84857303811&partnerID=40&md5=dde86bc8d9efda1128dad595cecbbaba
http://cmuir.cmu.ac.th/handle/6653943832/7367
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Institution: Chiang Mai University
Language: English

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http://www.scopus.com/inward/record.url?eid=2-s2.0-84857303811&partnerID=40&md5=dde86bc8d9efda1128dad595cecbbaba
http://cmuir.cmu.ac.th/handle/6653943832/7367

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