Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography
In this study, poly(methyl methacrylate) (PMMA) was investigated as a negative resist by irradiation with a high-fluence 2 MeV proton beam. The beam from a 1.7 MV Tandetron accelerator at the Plasma and Beam Physics Research Facility (PBP) of Chiang Mai University is shaped by a pair of computer-con...
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th-cmuir.6653943832-73682014-08-30T04:00:54Z Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography Puttaraksa N. Unai S. Rhodes M.W. Singkarat K. Whitlow H.J. Singkarat S. In this study, poly(methyl methacrylate) (PMMA) was investigated as a negative resist by irradiation with a high-fluence 2 MeV proton beam. The beam from a 1.7 MV Tandetron accelerator at the Plasma and Beam Physics Research Facility (PBP) of Chiang Mai University is shaped by a pair of computer-controlled L-shaped apertures which are used to expose rectangular pattern elements with 1-1000 μm side length. Repeated exposure of rectangular pattern elements allows a complex pattern to be built up. After subsequent development, the negative PMMA microstructure was used as a master mold for casting poly(dimethylsiloxane) (PDMS) following a standard soft-lithography process. The PDMS chip fabricated by this technique was demonstrated to be a microfluidic device. © 2011 Elsevier B.V. All rights reserved. 2014-08-30T04:00:54Z 2014-08-30T04:00:54Z Article in Press 0168583X 10.1016/j.nimb.2011.01.053 NIMBE http://www.scopus.com/inward/record.url?eid=2-s2.0-79951953992&partnerID=40&md5=c51b8a5b814072c61742121fc4fdb141 http://cmuir.cmu.ac.th/handle/6653943832/7368 English |
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In this study, poly(methyl methacrylate) (PMMA) was investigated as a negative resist by irradiation with a high-fluence 2 MeV proton beam. The beam from a 1.7 MV Tandetron accelerator at the Plasma and Beam Physics Research Facility (PBP) of Chiang Mai University is shaped by a pair of computer-controlled L-shaped apertures which are used to expose rectangular pattern elements with 1-1000 μm side length. Repeated exposure of rectangular pattern elements allows a complex pattern to be built up. After subsequent development, the negative PMMA microstructure was used as a master mold for casting poly(dimethylsiloxane) (PDMS) following a standard soft-lithography process. The PDMS chip fabricated by this technique was demonstrated to be a microfluidic device. © 2011 Elsevier B.V. All rights reserved. |
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Article |
author |
Puttaraksa N. Unai S. Rhodes M.W. Singkarat K. Whitlow H.J. Singkarat S. |
spellingShingle |
Puttaraksa N. Unai S. Rhodes M.W. Singkarat K. Whitlow H.J. Singkarat S. Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography |
author_facet |
Puttaraksa N. Unai S. Rhodes M.W. Singkarat K. Whitlow H.J. Singkarat S. |
author_sort |
Puttaraksa N. |
title |
Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography |
title_short |
Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography |
title_full |
Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography |
title_fullStr |
Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography |
title_full_unstemmed |
Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography |
title_sort |
fabrication of a negative pmma master mold for soft-lithography by mev ion beam lithography |
publishDate |
2014 |
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http://www.scopus.com/inward/record.url?eid=2-s2.0-79951953992&partnerID=40&md5=c51b8a5b814072c61742121fc4fdb141 http://cmuir.cmu.ac.th/handle/6653943832/7368 |
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