Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography

In this study, poly(methyl methacrylate) (PMMA) was investigated as a negative resist by irradiation with a high-fluence 2 MeV proton beam. The beam from a 1.7 MV Tandetron accelerator at the Plasma and Beam Physics Research Facility (PBP) of Chiang Mai University is shaped by a pair of computer-con...

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Main Authors: Puttaraksa N., Unai S., Rhodes M.W., Singkarat K., Whitlow H.J., Singkarat S.
Format: Article
Language:English
Published: 2014
Online Access:http://www.scopus.com/inward/record.url?eid=2-s2.0-79951953992&partnerID=40&md5=c51b8a5b814072c61742121fc4fdb141
http://cmuir.cmu.ac.th/handle/6653943832/7368
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spelling th-cmuir.6653943832-73682014-08-30T04:00:54Z Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography Puttaraksa N. Unai S. Rhodes M.W. Singkarat K. Whitlow H.J. Singkarat S. In this study, poly(methyl methacrylate) (PMMA) was investigated as a negative resist by irradiation with a high-fluence 2 MeV proton beam. The beam from a 1.7 MV Tandetron accelerator at the Plasma and Beam Physics Research Facility (PBP) of Chiang Mai University is shaped by a pair of computer-controlled L-shaped apertures which are used to expose rectangular pattern elements with 1-1000 μm side length. Repeated exposure of rectangular pattern elements allows a complex pattern to be built up. After subsequent development, the negative PMMA microstructure was used as a master mold for casting poly(dimethylsiloxane) (PDMS) following a standard soft-lithography process. The PDMS chip fabricated by this technique was demonstrated to be a microfluidic device. © 2011 Elsevier B.V. All rights reserved. 2014-08-30T04:00:54Z 2014-08-30T04:00:54Z Article in Press 0168583X 10.1016/j.nimb.2011.01.053 NIMBE http://www.scopus.com/inward/record.url?eid=2-s2.0-79951953992&partnerID=40&md5=c51b8a5b814072c61742121fc4fdb141 http://cmuir.cmu.ac.th/handle/6653943832/7368 English
institution Chiang Mai University
building Chiang Mai University Library
country Thailand
collection CMU Intellectual Repository
language English
description In this study, poly(methyl methacrylate) (PMMA) was investigated as a negative resist by irradiation with a high-fluence 2 MeV proton beam. The beam from a 1.7 MV Tandetron accelerator at the Plasma and Beam Physics Research Facility (PBP) of Chiang Mai University is shaped by a pair of computer-controlled L-shaped apertures which are used to expose rectangular pattern elements with 1-1000 μm side length. Repeated exposure of rectangular pattern elements allows a complex pattern to be built up. After subsequent development, the negative PMMA microstructure was used as a master mold for casting poly(dimethylsiloxane) (PDMS) following a standard soft-lithography process. The PDMS chip fabricated by this technique was demonstrated to be a microfluidic device. © 2011 Elsevier B.V. All rights reserved.
format Article
author Puttaraksa N.
Unai S.
Rhodes M.W.
Singkarat K.
Whitlow H.J.
Singkarat S.
spellingShingle Puttaraksa N.
Unai S.
Rhodes M.W.
Singkarat K.
Whitlow H.J.
Singkarat S.
Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography
author_facet Puttaraksa N.
Unai S.
Rhodes M.W.
Singkarat K.
Whitlow H.J.
Singkarat S.
author_sort Puttaraksa N.
title Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography
title_short Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography
title_full Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography
title_fullStr Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography
title_full_unstemmed Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography
title_sort fabrication of a negative pmma master mold for soft-lithography by mev ion beam lithography
publishDate 2014
url http://www.scopus.com/inward/record.url?eid=2-s2.0-79951953992&partnerID=40&md5=c51b8a5b814072c61742121fc4fdb141
http://cmuir.cmu.ac.th/handle/6653943832/7368
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