Effect of Halo structure variations on the threshold voltage of a 22 nm gate length NMOS transistor

by Afifah Maheran A.H., Menon P.S., Ahmad I., Shaari S.
Published 2023

Minimum leakage current optimization on 22 nm SOI NMOS device with HfO2/WSix/Graphene gate structure using Taguchi method.

by Afifah Maheran A.H., Firhat E.N., Salehuddin F., Mohd Zain A.S., Ahmad I., Noor Faizah Z.A., Menon P.S., Elgomati H.A., Roslan A.F.
Published 2023

Threshold voltage optimization in a 22nm High-k/Salicide PMOS device

by Afifah Maheran A.H., Menon P.S., Ahmad I., Yusoff Z.
Published 2023

Statistical optimization of process parameters for threshold voltage in 22 nm p-Type MOSFET using Taguchi method

by Maheran A.H.A., Menon P.S., Shaari S., Ahmad I., Faizah Z.A.N.
Published 2023

Statistical process modelling for 32nm high-K/metal gate PMOS device

by Maheran A.H.A., Noor Faizah Z.A., Menon P.S., Ahmad I., Apte P.R., Kalaivani T., Salehuddin F.
Published 2023

Threshold voltage and leakage current variability on process parameter in a 22nm PMOS Device

by Afifah Maheran A.H., Menon P.S., Ahmad I., Noor Faizah Z.A., Mohd Zain A.S., Salehuddin F., Sayed N.M.
Published 2023

Application of Taguchi method in designing a 22nm high-k/metal gate NMOS transistor

by Afifah Maheran A.H., Menon P.S., Ahmad I., Shaari S.
Published 2023

Design and optimization of 22nm NMOS transistor

by Afifah Maheran A.H., Menon P.S., Ahmad I., Shaari S., Elgomati H.A., Majlis B.Y., Salehuddin F.
Published 2023

Optimisation of process parameters for lower leakage current in 22 nm n-type MOSFET device using Taguchi method

by Afifah Maheran A.H., Menon P.S., Ahmad I., Shaari S.
Published 2023

Effect of process parameter variability on the threshold voltage of downscaled 22nm PMOS using taguchi method

by Maheran A.H.A., Menon P.S., Shaari S., Kalaivani T., Ahmad I., Faizah Z.A.N., Apte P.R.
Published 2023

Control factors optimization on threshold voltage and leakage current in 22 nm NMOS transistor using Taguchi method

by Afifah Maheran A.H., Menon P.S., Ahmad I., Salehuddin F., Mohd A.S., Noor Z.A., Elgomati H.A.
Published 2023

Optimisation of process parameters for lower leakage current in 22 nm n-type MOSFET device using Taguchi method

by Afifah Maheran A.H., Menon P.S., Ahmad I., Shaari S.
Published 2023

Development of process parameters for 22 nm PMOS using 2-D analytical modeling

by Maheran A.H.A., Menon P.S., Ahmad I., Shaari S., Faizah Z.A.N.
Published 2023

Process parameter optimisation for minimum leakage current in a 22nm p-type MOSFET using Taguchi method

by Afifah Maheran A.H., Menon P.S., Ahmad I., Salehuddin F., Mohd Zain A.S.
Published 2023

Design and optimization of 22 nm gate length high-k/metal gate NMOS transistor

by Afifah Maheran A.H., Menon P.S., Ahmad I., Shaari S., Elgomati H.A., Salehuddin F.
Published 2023

Scaling down of the 32 nm to 22 nm gate length NMOS transistor

by Afifah Maheran A.H., Menon P.S., Ahmad I., Elgomati H.A., Majlis B.Y., Salehuddin F.
Published 2023