Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides

by Chong, Y.F., Gossmann, H.-J.L., Thompson, M.O., Yang, S., Pey, K.L., Wee, A.T.S.
Published 2014

Reduction of carrier depletion in p+ polysilicon gates using laser thermal processing

by Chong, Y.F., Gossmann, H.-J.L., Thompson, M.O., Pey, K.L., Wee, A.T.S., Talwar, S., Chan, L.
Published 2014

Reduction of Polysilicon Gate Depletion Effect in NMOS Devices Using Laser Thermal Processing

by Chong, Y.F., Gossmann, H.-J.L., Pey, K.L., Thompson, M.O., Wee, A.T.S., Tung, C.H.
Published 2014

Laser thermal processing of amorphous silicon gates to reduce poly-depletion in CMOS devices

by Chong, Y.F., Gossmann, H.-J.L., Pey, K.-L., Thompson, M.O., Wee, A.T.S., Tung, C.H.
Published 2014

The effect of interatomic potential in molecular dynamics simulation of low energy ion implantation

by Chan, H.Y., Nordlund, K., Peltola, J., Gossmann, H.-J.L., Ma, N.L., Srinivasan, M.P., Benistant, F., Chan, L.
Published 2014

Molecular dynamics with phase-shift-based electronic stopping for calibration of ion implantation profiles in crystalline silicon

by Chan, H.Y., Nordlund, K., Gossmann, H.-J.L., Harris, M., Montgomery, N.J., Mulcahy, C.P.A., Biswas, S., Srinivasan, M.P., Benistant, F., Ng, C.M., Chan, L.
Published 2014

Application of molecular dynamics for low-energy ion implantation in crystalline silicon

by Chan, H.Y., Srinivasan, M.P., Montgomery, N.J., Mulcahy, C.P.A., Biswas, S., Gossmann, H.-J.L., Harris, M., Nordlund, K., Benistant, F., Ng, C.M., Gui, D., Chan, L.
Published 2014