Development of photolithography for the fabrication of novel GaAs based devices and diamond-like film based devices

by Prasad Krishnamachar.
Published 2011

Fabrication and characterization of microelectronic devices, circuits and systems IV

by Chan, Pak Kwong., Prasad, Krishnamachar.
Published 2008

A system health indicator for the distributed minority and majority voting based redundancy scheme

by Balasubramanian, Padmanabhan, Maskell, Douglas, Prasad, Krishnamachar
Published 2020

RESAC: a redundancy strategy involving approximate computing for error-tolerant applications

by Balasubramanian, Padmanabhan, Maskell, Douglas Leslie, Prasad, Krishnamachar
Published 2024

Development of deep submicron HEMT MMIC for millimetre-wave applications

by Ng, Geok Eng, Yuan, Xiaocong, Yoon, Soon Fatt, Radhakrishnan, K., Law, Choi Look, Ooi, Boon Siew, Prasad Krishnamachar
Published 2008

Fabrication and characterization of microelectronic devices, circuits and systems VI

by Radhakrishnan, K.
Published 2008

Improvement of contact resistance through barrier metallization optimization

by Goh, Edwin Beng Chye.
Published 2008

Improvement in speed performance through transistor process optimization

by Zheng, You.
Published 2008

Study and characterization of low dielectric constant materials for interlayer dielectric applications

by Narayanan, Babu
Published 2008

Source line resistance failure issues and process optimisation of self aligned source etch

by Su, Julia Hui Fong.
Published 2008

Influence of cleaning process on gate oxide integrity

by Liu, Qing Guang.
Published 2008

Significance of process exhaust system on wafer fab operation and its performance improvement

by Vedachalam Natanasabapathy
Published 2008

Characterization of deep trench etch recipe

by Tay, Chin Tiong.
Published 2008

Experimental study of copper contamination in VLSI technology

by Tey, Shih Hwee.
Published 2008

Process capability index (CPK) improvement for NMOS transistor IDSAT of 0.3 micrometer technology

by Goh, Beng Lee.
Published 2008

Characterization and reliability studies of oxides grown by wet and dry oxidations for 0.25 micrometer CMOS technology

by Chow, Yew Tuck.
Published 2008

Device "S" leakage failure due to plasma damage

by Tan, Siew Yoon.
Published 2008

Electromigration reliability of copper interconnect in submicron microelectronics application

by Ang, Kian Ann
Published 2008

Characteristics of chemical mechanical polishing in advanced wafer processing

by Huang, Wen Ke.
Published 2008

Power MOSFET yield improvement through the improvement and refinement of epitaxy process

by Ng, Kin Meng.
Published 2008