Nanoscale characterization and analysis of localized degradation and breakdown of high-k dielectric stacks

by Shubhakar.
Published 2013

Role of grain boundary percolative defects and localized trap generation on the reliability statistics of high-κ gate dielectric stacks

by Raghavan, Nagarajan, Pey, Kin Leong, Shubhakar, K., Wu, X., Liu, W. H., Bosman, Michel
Published 2013

Conductive Atomic Force Microscope Study of Bipolar and Threshold Resistive Switching in 2D Hexagonal Boron Nitride Films

by Ranjan, A, Raghavan, N, O'shea, S.J, Mei, S, Bosman, M, Shubhakar, K, Pey, K.L
Published 2020

Leakage current and structural analysis of annealed HfO2/La2O3 and CeO2/La2O3 dielectric stacks : a nanoscopic study

by Shubhakar, Kalya, Pey, Kin Leong, Kouda, Miyuki, Kakushima, Kuniyuki, Iwai, Hiroshi, Bosman, Michel, Kushvaha, Sunil Singh, O'Shea, Sean Joseph
Published 2014

Nanoscale physical analysis of localized breakdown events in HfO2/SiOX dielectric stacks : a correlation study of STM induced BD with C-AFM and TEM

by Shubhakar, K., Pey, Kin Leong, Bosman, Michel, Thamankar, R., Kushvaha, S. S., Loke, Y. C., Wang, Z. R., Raghavan, Nagarajan, Wu, X., O'Shea, S. J.
Published 2013