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Investigation of etching properties of HfO based high-K dielectrics using inductively coupled plasma
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by Jo J., Xiao Y., Sun A.X., Cukuroglu E., Tran H.-D., Göke J., Tan Z.Y., Saw T.Y., Tan C.-P., Lokman H., Lee Y., Kim D., Ko H.S., Kim S.-O., Park J.H., Cho N.-J., Hyde T.M., Kleinman J.E., Shin J.H., Weinberger D.R., Tan E.K., Je H.S., Ng H.-H.
Published 2018
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