GaInNAs double-barrier quantum well infrared photodetector with the photodetection at 1.24 μm
A GaInNAs/AlAs/AlGaAs double-barrier quantum well infrared photodetector was grown by molecular beam epitaxy and fabricated by standard device processes. The growth structure of the as-grown sample was verified by x-ray diffraction measurement. The photoluminescence emission peak, which is relate...
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Main Authors: | , , , , , , , , , , |
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其他作者: | |
格式: | Article |
語言: | English |
出版: |
2013
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主題: | |
在線閱讀: | https://hdl.handle.net/10356/100759 http://hdl.handle.net/10220/18144 |
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機構: | Nanyang Technological University |
語言: | English |
總結: | A GaInNAs/AlAs/AlGaAs double-barrier quantum well infrared photodetector was grown by
molecular beam epitaxy and fabricated by standard device processes. The growth structure of the
as-grown sample was verified by x-ray diffraction measurement. The photoluminescence emission
peak, which is related to the interband transition in the GaInNAs well, was observed at 1.2 eV.
After annealing at 650 °C, a large blueshift of 40 meV was observed. The photocurrent peak at
1.24 m is associated with the intersubband transitions in the conduction band of the GaInNAs
quantum well. The ten-band k· p calculations agree with the above observations. |
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