A micro-pulse process of atomic layer deposition of iron oxide using ferrocene and ozone precursors and Ti-doping

A micro-pulse process of atomic layer deposition of iron oxide using ferrocene and ozone precursors and Ti-doping

Hematite (α-Fe2O3) thin films are obtained by atomic layer deposition (ALD) in the temperature range 200 − 350°C using ferrocene and ozone as the precursors. A micro-pulse process facilitates the precursor adsorption and shortens the ferrocene dose time to 5 s. When tested on Si(100) substrates, the...

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Bibliographic Details
Main Authors: Li, Xianglin, Fan, Hong Jin, Ng, Chin Fan
Other Authors: School of Physical and Mathematical Sciences
Format: Article
Language:English
Published: 2013
Subjects:
DRNTU::Science::Chemistry
Online Access:https://hdl.handle.net/10356/104640
http://hdl.handle.net/10220/16848
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Institution: Nanyang Technological University
Language: English

Internet

https://hdl.handle.net/10356/104640
http://hdl.handle.net/10220/16848

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