A micro-pulse process of atomic layer deposition of iron oxide using ferrocene and ozone precursors and Ti-doping
Hematite (α-Fe2O3) thin films are obtained by atomic layer deposition (ALD) in the temperature range 200 − 350°C using ferrocene and ozone as the precursors. A micro-pulse process facilitates the precursor adsorption and shortens the ferrocene dose time to 5 s. When tested on Si(100) substrates, the...
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| Main Authors: | , , |
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| Other Authors: | |
| Format: | Article |
| Language: | English |
| Published: |
2013
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| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/104640 http://hdl.handle.net/10220/16848 |
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| Institution: | Nanyang Technological University |
| Language: | English |