A micro-pulse process of atomic layer deposition of iron oxide using ferrocene and ozone precursors and Ti-doping

• Main Authors: Li, Xianglin, Fan, Hong Jin, Ng, Chin Fan
• Other Authors: School of Physical and Mathematical Sciences
• Format: Article
• Language: English
• Published: 2013
• Subjects: DRNTU::Science::Chemistry
• Online Access: https://hdl.handle.net/10356/104640; http://hdl.handle.net/10220/16848
• Institution: Nanyang Technological University

Hematite (α-Fe2O3) thin films are obtained by atomic layer deposition (ALD) in the temperature range 200 − 350°C using ferrocene and ozone as the precursors. A micro-pulse process facilitates the precursor adsorption and shortens the ferrocene dose time to 5 s. When tested on Si(100) substrates, the...