Reverse short channel effects in nMOSFETs

Rapid advancement of the Metal-Oxide-Semiconductor (MOS) transistor in the last two decades has seen the approach of the 0.18um technology. However, this has caused phenomena that had not been previously observed. Two of these are the Reverse Short Channel Effects (RSCE) and the Transient Enhanced D...

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Main Author: Lee, Teck Koon.
Other Authors: Liu Po-Ching
Format: Theses and Dissertations
Language:English
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/13234
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-132342023-07-04T15:49:58Z Reverse short channel effects in nMOSFETs Lee, Teck Koon. Liu Po-Ching School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Semiconductors Rapid advancement of the Metal-Oxide-Semiconductor (MOS) transistor in the last two decades has seen the approach of the 0.18um technology. However, this has caused phenomena that had not been previously observed. Two of these are the Reverse Short Channel Effects (RSCE) and the Transient Enhanced Diffusion (TED). The Reverse Short Channel Effects is the anomalous increase in the threshold voltage of devices as channel lengths are reduced and the latter is the enhanced diffusion of the implanted dopants following rapid thermal annealing. Master of Engineering 2008-10-20T07:20:40Z 2008-10-20T07:20:40Z 1999 1999 Thesis http://hdl.handle.net/10356/13234 en 96 p. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic DRNTU::Engineering::Electrical and electronic engineering::Semiconductors
spellingShingle DRNTU::Engineering::Electrical and electronic engineering::Semiconductors
Lee, Teck Koon.
Reverse short channel effects in nMOSFETs
description Rapid advancement of the Metal-Oxide-Semiconductor (MOS) transistor in the last two decades has seen the approach of the 0.18um technology. However, this has caused phenomena that had not been previously observed. Two of these are the Reverse Short Channel Effects (RSCE) and the Transient Enhanced Diffusion (TED). The Reverse Short Channel Effects is the anomalous increase in the threshold voltage of devices as channel lengths are reduced and the latter is the enhanced diffusion of the implanted dopants following rapid thermal annealing.
author2 Liu Po-Ching
author_facet Liu Po-Ching
Lee, Teck Koon.
format Theses and Dissertations
author Lee, Teck Koon.
author_sort Lee, Teck Koon.
title Reverse short channel effects in nMOSFETs
title_short Reverse short channel effects in nMOSFETs
title_full Reverse short channel effects in nMOSFETs
title_fullStr Reverse short channel effects in nMOSFETs
title_full_unstemmed Reverse short channel effects in nMOSFETs
title_sort reverse short channel effects in nmosfets
publishDate 2008
url http://hdl.handle.net/10356/13234
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