Filtered cathodic vacuum arc deposition of metal nitrides
The numerous applications of group III nitride semiconductors have attracted significant research interest over the last decade. A novel ion-beam assisted filtered cathodic vacuum arc (I-FCVA) technique has been developed to fabricate III nitrides using pure metallic target as metal source. For the...
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sg-ntu-dr.10356-190832023-07-04T17:29:39Z Filtered cathodic vacuum arc deposition of metal nitrides Ji, Xiaohong Lau Shu Ping, Daniel School of Electrical and Electronic Engineering DRNTU::Engineering::Materials::Microelectronics and semiconductor materials The numerous applications of group III nitride semiconductors have attracted significant research interest over the last decade. A novel ion-beam assisted filtered cathodic vacuum arc (I-FCVA) technique has been developed to fabricate III nitrides using pure metallic target as metal source. For the first time, FCVA technique is capable of handling low melting point metal target such as Ga and In. Binary III nitrades (AIN, GaN, InN) on Si subtrates have been fabricated, characterized and analyzed. DOCTOR OF PHILOSOPHY (EEE) 2009-10-05T03:02:33Z 2009-10-05T03:02:33Z 2006 2006 Thesis Ji, X. (2006). Filtered cathodic vacuum arc deposition of metal nitrides. Doctoral thesis, Nanyang Technological University, Singapore. https://hdl.handle.net/10356/19083 10.32657/10356/19083 en 140 p. application/pdf |
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DRNTU::Engineering::Materials::Microelectronics and semiconductor materials Ji, Xiaohong Filtered cathodic vacuum arc deposition of metal nitrides |
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The numerous applications of group III nitride semiconductors have attracted significant research interest over the last decade. A novel ion-beam assisted filtered cathodic vacuum arc (I-FCVA) technique has been developed to fabricate III nitrides using pure metallic target as metal source. For the first time, FCVA technique is capable of handling low melting point metal target such as Ga and In. Binary III nitrades (AIN, GaN, InN) on Si subtrates have been fabricated, characterized and analyzed. |
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Lau Shu Ping, Daniel |
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Lau Shu Ping, Daniel Ji, Xiaohong |
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Theses and Dissertations |
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Ji, Xiaohong |
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Ji, Xiaohong |
title |
Filtered cathodic vacuum arc deposition of metal nitrides |
title_short |
Filtered cathodic vacuum arc deposition of metal nitrides |
title_full |
Filtered cathodic vacuum arc deposition of metal nitrides |
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Filtered cathodic vacuum arc deposition of metal nitrides |
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Filtered cathodic vacuum arc deposition of metal nitrides |
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filtered cathodic vacuum arc deposition of metal nitrides |
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2009 |
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https://hdl.handle.net/10356/19083 |
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1772827132728180736 |