Filtered cathodic vacuum arc deposition of metal nitrides

The numerous applications of group III nitride semiconductors have attracted significant research interest over the last decade. A novel ion-beam assisted filtered cathodic vacuum arc (I-FCVA) technique has been developed to fabricate III nitrides using pure metallic target as metal source. For the...

全面介紹

Saved in:
書目詳細資料
主要作者: Ji, Xiaohong
其他作者: Lau Shu Ping, Daniel
格式: Theses and Dissertations
語言:English
出版: 2009
主題:
在線閱讀:https://hdl.handle.net/10356/19083
標簽: 添加標簽
沒有標簽, 成為第一個標記此記錄!