A steady-state RF inductively coupled plasma source for plasma processing

A steady-state RF inductively coupled plasma source for plasma processing

This project aims at developing the low-frequency, uniform and high density plasma source for materials processing. The uniform, large (32 cm in diameter), high-density plasma source capable of rapid processign of large substrates has been developed and investigated both theoretically and experimen...

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Bibliographic Details
Main Authors: Xu, Shuyan, Ahn, Jaeshin, Ostrikov, Kostyantyn
Other Authors: School of Electrical and Electronic Engineering
Format: Research Report
Published: 2008
Subjects:
DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
Online Access:http://hdl.handle.net/10356/2741
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Institution: Nanyang Technological University
Description
Summary:This project aims at developing the low-frequency, uniform and high density plasma source for materials processing. The uniform, large (32 cm in diameter), high-density plasma source capable of rapid processign of large substrates has been developed and investigated both theoretically and experimentally.

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