A steady-state RF inductively coupled plasma source for plasma processing

• Main Authors: Xu, Shuyan, Ahn, Jaeshin, Ostrikov, Kostyantyn
• Other Authors: School of Electrical and Electronic Engineering
• Format: Research Report
• Published: 2008
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
• Online Access: http://hdl.handle.net/10356/2741
• Institution: Nanyang Technological University

This project aims at developing the low-frequency, uniform and high density plasma source for materials processing. The uniform, large (32 cm in diameter), high-density plasma source capable of rapid processign of large substrates has been developed and investigated both theoretically and experimen...