A steady-state RF inductively coupled plasma source for plasma processing

• Main Authors: Xu, Shuyan, Ahn, Jaeshin, Ostrikov, Kostyantyn
• 其他作者: School of Electrical and Electronic Engineering
• 格式: Research Report
• 出版: 2008
• 主題: DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
• 在線閱讀: http://hdl.handle.net/10356/2741

This project aims at developing the low-frequency, uniform and high density plasma source for materials processing. The uniform, large (32 cm in diameter), high-density plasma source capable of rapid processign of large substrates has been developed and investigated both theoretically and experimen...