Development of amorphous silicon carbide semiconductor thin films for optoelectronic device applications

• المؤلف الرئيسي: Yoon, Soon Fatt.
• مؤلفون آخرون: School of Electrical and Electronic Engineering
• التنسيق: Research Report
• منشور في: 2008
• الموضوعات: DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
• الوصول للمادة أونلاين: http://hdl.handle.net/10356/3016

Its primary objective was to investigate the use of the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique to deposit amorphous and microcrystalline hydrogenated silicon carbide films (SiC:H) with a view for the eventual use of such films for optoelectronic applications.