Effects of copper diffusion on the performance of MOS devices

Results are presented on the stress studies in various diffusion barriers used in Al and Cu metallizations for MOS devices. Results are also presented on the effect of deliberate Cu contamination on the performance of MOS devices.

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Bibliographic Details
Main Author:	Tee, Kheng Chok.
Other Authors:	Prasad, K.
Format:	Theses and Dissertations
Published:	2008
Subjects:	DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
Online Access:	http://hdl.handle.net/10356/3535
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Institution:	Nanyang Technological University

id	sg-ntu-dr.10356-3535
record_format	dspace
spelling	sg-ntu-dr.10356-35352023-07-04T15:08:02Z Effects of copper diffusion on the performance of MOS devices Tee, Kheng Chok. Prasad, K. School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials Results are presented on the stress studies in various diffusion barriers used in Al and Cu metallizations for MOS devices. Results are also presented on the effect of deliberate Cu contamination on the performance of MOS devices. Master of Engineering 2008-09-17T09:31:46Z 2008-09-17T09:31:46Z 2000 2000 Thesis http://hdl.handle.net/10356/3535 Nanyang Technological University application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
topic	DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
spellingShingle	DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials Tee, Kheng Chok. Effects of copper diffusion on the performance of MOS devices
description	Results are presented on the stress studies in various diffusion barriers used in Al and Cu metallizations for MOS devices. Results are also presented on the effect of deliberate Cu contamination on the performance of MOS devices.
author2	Prasad, K.
author_facet	Prasad, K. Tee, Kheng Chok.
format	Theses and Dissertations
author	Tee, Kheng Chok.
author_sort	Tee, Kheng Chok.
title	Effects of copper diffusion on the performance of MOS devices
title_short	Effects of copper diffusion on the performance of MOS devices
title_full	Effects of copper diffusion on the performance of MOS devices
title_fullStr	Effects of copper diffusion on the performance of MOS devices
title_full_unstemmed	Effects of copper diffusion on the performance of MOS devices
title_sort	effects of copper diffusion on the performance of mos devices
publishDate	2008
url	http://hdl.handle.net/10356/3535
_version_	1772825983006539776

Effects of copper diffusion on the performance of MOS devices

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