Development of void growth model during electromigration test

• Main Author: Yeo, Mei Chun.
• Other Authors: Tan, Cher Ming
• Format: Theses and Dissertations
• Published: 2008
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
• Online Access: http://hdl.handle.net/10356/3886
• Institution: Nanyang Technological University

Electromigration (EM) has been researched extensively for the past 30 years. Despite the huge amount of research conducted, electromigration is not yet fully understood. Furthermore, results produced by some researchers are contradictory, which adds confusion onto the deficiency. The cause is mainly...