Deposition of highly oriented diamond films by microwave plasma enhanced CVD

In this study, the deposition of {100} textured and highly oriented diamond films has been successfully realized. Investigation was conducted to clarify the influences of various parameters on the growth of {100} textured and highly oriented diamond films. Problems and the growth mechanisms of hi...

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Main Author:	Liao, Xiao Ning.
Other Authors:	Jaeshin, Ahn
Format:	Theses and Dissertations
Published:	2010
Subjects:	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Online Access:	http://hdl.handle.net/10356/39004
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Institution:	Nanyang Technological University

id	sg-ntu-dr.10356-39004
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spelling	sg-ntu-dr.10356-390042023-07-04T16:00:45Z Deposition of highly oriented diamond films by microwave plasma enhanced CVD Liao, Xiao Ning. Jaeshin, Ahn School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Microelectronics In this study, the deposition of {100} textured and highly oriented diamond films has been successfully realized. Investigation was conducted to clarify the influences of various parameters on the growth of {100} textured and highly oriented diamond films. Problems and the growth mechanisms of highly oriented diamond growth have been studied and corresponding solutions for the problems are also discussed. Among the parameters, gas composition and microwave power were found to be the two most influential factors for the textured growth of diamond thin films. Substrate temperature also has a significant effect on the textured growth whereas the influence of gas pressure and flow rate was not significant. Master of Engineering 2010-05-21T03:39:47Z 2010-05-21T03:39:47Z 1997 1997 Thesis http://hdl.handle.net/10356/39004 NANYANG TECHNOLOGICAL UNIVERSITY 123 p. application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
topic	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
spellingShingle	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics Liao, Xiao Ning. Deposition of highly oriented diamond films by microwave plasma enhanced CVD
description	In this study, the deposition of {100} textured and highly oriented diamond films has been successfully realized. Investigation was conducted to clarify the influences of various parameters on the growth of {100} textured and highly oriented diamond films. Problems and the growth mechanisms of highly oriented diamond growth have been studied and corresponding solutions for the problems are also discussed. Among the parameters, gas composition and microwave power were found to be the two most influential factors for the textured growth of diamond thin films. Substrate temperature also has a significant effect on the textured growth whereas the influence of gas pressure and flow rate was not significant.
author2	Jaeshin, Ahn
author_facet	Jaeshin, Ahn Liao, Xiao Ning.
format	Theses and Dissertations
author	Liao, Xiao Ning.
author_sort	Liao, Xiao Ning.
title	Deposition of highly oriented diamond films by microwave plasma enhanced CVD
title_short	Deposition of highly oriented diamond films by microwave plasma enhanced CVD
title_full	Deposition of highly oriented diamond films by microwave plasma enhanced CVD
title_fullStr	Deposition of highly oriented diamond films by microwave plasma enhanced CVD
title_full_unstemmed	Deposition of highly oriented diamond films by microwave plasma enhanced CVD
title_sort	deposition of highly oriented diamond films by microwave plasma enhanced cvd
publishDate	2010
url	http://hdl.handle.net/10356/39004
_version_	1772828789226602496

Deposition of highly oriented diamond films by microwave plasma enhanced CVD

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