Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications

This study deals with three kinds of metal oxide thin films, namely zirconium oxide, titanium oxide and aluminium oxide, prepared by filtered cathodic vacuum arc (FCVA). The influences of various process parameters (e.g. working pressure, substrate temperature & bias, etc.) on the film propertie...

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Main Author: Zhao, Zhiwei
Other Authors: Tay Beng Kang
Format: Theses and Dissertations
Published: 2008
Subjects:
Online Access:https://hdl.handle.net/10356/4033
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Institution: Nanyang Technological University
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spelling sg-ntu-dr.10356-40332023-07-04T17:16:21Z Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications Zhao, Zhiwei Tay Beng Kang School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films This study deals with three kinds of metal oxide thin films, namely zirconium oxide, titanium oxide and aluminium oxide, prepared by filtered cathodic vacuum arc (FCVA). The influences of various process parameters (e.g. working pressure, substrate temperature & bias, etc.) on the film properties are investigated, with much attention paid to the film optical properties. DOCTOR OF PHILOSOPHY (EEE) 2008-09-17T09:42:59Z 2008-09-17T09:42:59Z 2005 2005 Thesis Zhao, Z. W. (2005). Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications. Doctoral thesis, Nanyang Technological University, Singapore. https://hdl.handle.net/10356/4033 10.32657/10356/4033 Nanyang Technological University application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
topic DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
spellingShingle DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Zhao, Zhiwei
Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications
description This study deals with three kinds of metal oxide thin films, namely zirconium oxide, titanium oxide and aluminium oxide, prepared by filtered cathodic vacuum arc (FCVA). The influences of various process parameters (e.g. working pressure, substrate temperature & bias, etc.) on the film properties are investigated, with much attention paid to the film optical properties.
author2 Tay Beng Kang
author_facet Tay Beng Kang
Zhao, Zhiwei
format Theses and Dissertations
author Zhao, Zhiwei
author_sort Zhao, Zhiwei
title Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications
title_short Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications
title_full Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications
title_fullStr Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications
title_full_unstemmed Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications
title_sort growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications
publishDate 2008
url https://hdl.handle.net/10356/4033
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