Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications
This study deals with three kinds of metal oxide thin films, namely zirconium oxide, titanium oxide and aluminium oxide, prepared by filtered cathodic vacuum arc (FCVA). The influences of various process parameters (e.g. working pressure, substrate temperature & bias, etc.) on the film propertie...
Saved in:
Main Author: | |
---|---|
Other Authors: | |
Format: | Theses and Dissertations |
Published: |
2008
|
Subjects: | |
Online Access: | https://hdl.handle.net/10356/4033 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
id |
sg-ntu-dr.10356-4033 |
---|---|
record_format |
dspace |
spelling |
sg-ntu-dr.10356-40332023-07-04T17:16:21Z Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications Zhao, Zhiwei Tay Beng Kang School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films This study deals with three kinds of metal oxide thin films, namely zirconium oxide, titanium oxide and aluminium oxide, prepared by filtered cathodic vacuum arc (FCVA). The influences of various process parameters (e.g. working pressure, substrate temperature & bias, etc.) on the film properties are investigated, with much attention paid to the film optical properties. DOCTOR OF PHILOSOPHY (EEE) 2008-09-17T09:42:59Z 2008-09-17T09:42:59Z 2005 2005 Thesis Zhao, Z. W. (2005). Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications. Doctoral thesis, Nanyang Technological University, Singapore. https://hdl.handle.net/10356/4033 10.32657/10356/4033 Nanyang Technological University application/pdf |
institution |
Nanyang Technological University |
building |
NTU Library |
continent |
Asia |
country |
Singapore Singapore |
content_provider |
NTU Library |
collection |
DR-NTU |
topic |
DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films |
spellingShingle |
DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films Zhao, Zhiwei Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications |
description |
This study deals with three kinds of metal oxide thin films, namely zirconium oxide, titanium oxide and aluminium oxide, prepared by filtered cathodic vacuum arc (FCVA). The influences of various process parameters (e.g. working pressure, substrate temperature & bias, etc.) on the film properties are investigated, with much attention paid to the film optical properties. |
author2 |
Tay Beng Kang |
author_facet |
Tay Beng Kang Zhao, Zhiwei |
format |
Theses and Dissertations |
author |
Zhao, Zhiwei |
author_sort |
Zhao, Zhiwei |
title |
Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications |
title_short |
Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications |
title_full |
Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications |
title_fullStr |
Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications |
title_full_unstemmed |
Growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications |
title_sort |
growth and characterization of oxide thin films by filtered cathodic vacuum arc and their applications |
publishDate |
2008 |
url |
https://hdl.handle.net/10356/4033 |
_version_ |
1772825677739851776 |