Analysis of mesoporous ultra low K dielectric materials for microelectronic interconnects

The project analysed the mesoporous ultra low K dielectric materials for microelectronic interconnects.

Saved in:
Bibliographic Details
Main Author: Goh, Tat Kean.
Other Authors: Wong, Terence Kin Shun
Format: Theses and Dissertations
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/4303
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University
Description
Summary:The project analysed the mesoporous ultra low K dielectric materials for microelectronic interconnects.