Development of silicon carbide thin films for optoelectronic device applications

In this project, the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique has been used to deposit amorphous (a-SiC:H) and microcrystalline (mc-SiC3-I) films for characterisation of their optical, electrical and structural properties using transmittance/reflectance measuremen...

Full description

Saved in:

Bibliographic Details
Main Author:	Ji, Rong
Other Authors:	Yoon, Soon Fatt
Format:	Theses and Dissertations
Published:	2008
Subjects:	DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
Online Access:	http://hdl.handle.net/10356/4461
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	Nanyang Technological University

id	sg-ntu-dr.10356-4461
record_format	dspace
spelling	sg-ntu-dr.10356-44612023-07-04T15:17:22Z Development of silicon carbide thin films for optoelectronic device applications Ji, Rong Yoon, Soon Fatt School of Electrical and Electronic Engineering DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics In this project, the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique has been used to deposit amorphous (a-SiC:H) and microcrystalline (mc-SiC3-I) films for characterisation of their optical, electrical and structural properties using transmittance/reflectance measurements, variable-temperature current-voltage (I-V) characterisation, Raman scattering and Fourier transform IR spectroscopy. Master of Engineering 2008-09-17T09:51:58Z 2008-09-17T09:51:58Z 1996 1996 Thesis http://hdl.handle.net/10356/4461 Nanyang Technological University application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
topic	DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
spellingShingle	DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics Ji, Rong Development of silicon carbide thin films for optoelectronic device applications
description	In this project, the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique has been used to deposit amorphous (a-SiC:H) and microcrystalline (mc-SiC3-I) films for characterisation of their optical, electrical and structural properties using transmittance/reflectance measurements, variable-temperature current-voltage (I-V) characterisation, Raman scattering and Fourier transform IR spectroscopy.
author2	Yoon, Soon Fatt
author_facet	Yoon, Soon Fatt Ji, Rong
format	Theses and Dissertations
author	Ji, Rong
author_sort	Ji, Rong
title	Development of silicon carbide thin films for optoelectronic device applications
title_short	Development of silicon carbide thin films for optoelectronic device applications
title_full	Development of silicon carbide thin films for optoelectronic device applications
title_fullStr	Development of silicon carbide thin films for optoelectronic device applications
title_full_unstemmed	Development of silicon carbide thin films for optoelectronic device applications
title_sort	development of silicon carbide thin films for optoelectronic device applications
publishDate	2008
url	http://hdl.handle.net/10356/4461
_version_	1772828457357541376

Development of silicon carbide thin films for optoelectronic device applications

Similar Items