Application of phase shift masking to sub-0.13 micron lithography

• المؤلف الرئيسي: Koo, Chee Kiong.
• مؤلفون آخرون: Yuan, Larry X.-C.
• التنسيق: Theses and Dissertations
• منشور في: 2008
• الموضوعات: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
• الوصول للمادة أونلاين: http://hdl.handle.net/10356/4521

The main contribution of this thesis is to investigate the application of PSM, combined with other forms of RET, such as OAI and OPC, to poly gate patterning.