Impact of spike anneal on ultra shallow junction formation

• Main Author: Lai, Chung Woh
• Other Authors: School of Electrical and Electronic Engineering
• Format: Theses and Dissertations
• Published: 2008
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
• Online Access: http://hdl.handle.net/10356/4545
• Institution: Nanyang Technological University

This report explains the need for ultra shallow junctions for modern day CMOS devices, how spike anneal can help achieve this, reviews the important parameters if this process and how these parameters affect the performances of the CMOS transistors.