Impact of spike anneal on ultra shallow junction formation

Impact of spike anneal on ultra shallow junction formation

This report explains the need for ultra shallow junctions for modern day CMOS devices, how spike anneal can help achieve this, reviews the important parameters if this process and how these parameters affect the performances of the CMOS transistors.

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Bibliographic Details
Main Author: Lai, Chung Woh
Other Authors: School of Electrical and Electronic Engineering
Format: Theses and Dissertations
Published: 2008
Subjects:
DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Online Access:http://hdl.handle.net/10356/4545
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Institution: Nanyang Technological University
Description
Summary:This report explains the need for ultra shallow junctions for modern day CMOS devices, how spike anneal can help achieve this, reviews the important parameters if this process and how these parameters affect the performances of the CMOS transistors.

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